Plan achromat objective 4X/0.1, WD 18.5 4X平場消色差物鏡, NA 0.1, 工作距離18.5mm
PLCN10X
Plan achromat objective 10X/0.25, WD 10.6 10X平場消色差物鏡, NA 0.25, 工作距離10.6mm
PLCN20X
Plan achromat objective 20X/0.4, WD 1.2 20X平場消色差物鏡, NA 0.4, 工作距離1.2mm
PLCN40X
Plan achromat objective 40X/0.65, WD 0.6(spring) 40X平場消色差物鏡, NA 0.65, 工作距離0.6mm
PLCN60X
Plan achromat objective 60X/0.8, WD 0.2(spring) 60X平場消色差物鏡, NA 0.8, 工作距離0.2mm
PLCN100XO
Plan achromat objective 100X/1.25, WD 0.13(spring, oil) 100X平場消色差油浸物鏡, NA 1.25, 工作距離0.13mm
PLCN100XOI
Plan achromat objective 100X/0.6-1.25, WD 0.13(spring, oil, iris) 100X平場消色差油浸物鏡, NA 0.6-1.25, 工作距離0.13mm,帶虹彩光闌
PLN2X
Plan achromat objective 2X/0.06, WD 5.8 2X平場消色差物鏡, NA 0.06, 工作距離5.8mm
PLN4X
Plan achromat objective 4X/0.1, WD 18.5 4X平場消色差物鏡, NA 0.1, 工作距離18.5mm
PLN10X
Plan achromat objective 10X/0.25, WD 10.6 10X平場消色差物鏡, NA 0.25, 工作距離10.6mm
PLN20X
Plan achromat objective 20X/0.4, WD 1.2(spring) 20X平場消色差物鏡, NA 0.4, 工作距離1.2mm
PLN40X
Plan achromat objective 40X/0.65, WD 0.6(spring) 40X平場消色差物鏡, NA 0.65, 工作距離0.6mm
PLN50XOI
Plan achromat objective 50X/0.9-0.5, WD 0.2(spring, iris, oil) 50X平場消色差油浸物鏡, NA 0.9-0.5, 工作距離0.2mm,帶虹彩光闌
PLN100XO
Plan achromat objective 100X/1.25, WD 0.15(spring, oil) 100X平場消色差油浸物鏡, NA 1.25, 工作距離0.15mm
UPLFLN4X
U plan semi apochromat objective 4X/0.13, WD 17 4X平場半復(fù)消色差物鏡, NA 0.13, 工作距離17mm
UPLFLN10X2
U Plan Semi Apochromat objective 10X/0.3, WD 10 10X平場半復(fù)消色差物鏡, NA 0.3, 工作距離10mm
UPLFLN20X
U plan semi apochromat objective 20X/0.5, WD 2.1 20X平場半復(fù)消色差物鏡, NA 0.5, 工作距離2.1mm
UPLFLN40X
U plan semi apochromat objective 40X/0.75, WD 0.51(spring) 40X平場半復(fù)消色差物鏡, NA 0.75, 工作距離0.51mm
UPLFLN60X
U plan semi apochromat objective 60X/0.9 WD 0.2 with correction collar(spring, c.c. 0.11-0.23) 60X平場半復(fù)消色差物鏡, NA 0.9, 工作距離0.2mm
UPLFLN60XOI
U plan semi apochromat objective 60X/1.25-0.65, WD 0.12(spring, iris, oil) 60X平場半復(fù)消色差油浸物鏡, NA 1.25-0.65, 工作距離0.12mm,帶虹彩光闌
UPLFLN100XO2
U Plan Semi Apochromat objective 100X/1.3, WD 0.2(spring, oil) 100X平場半復(fù)消色差油浸物鏡, NA 1.3, 工作距離0.2mm
UPLFLN100XOI2
U Plan Semi Apochromat objective 100X/1.3-0.6, WD 0.2(spring, oil, iris) 100X平場半復(fù)消色差油浸物鏡, NA 1.3-0.6, 工作距離0.2mm,帶虹彩光闌
PLFLN100X
Plan semi apochromat objective 100X/0.95, W.D. 0.2, including plastic case AZ9525 and cap AZ9526 100X平場半復(fù)消色差物鏡, NA 0.95, 工作距離0.2mm
UPLXAPO4X
U Plan XApochromat objective 4X/0.16, WD 13mm,Corrected wavelength400-1000nm. 4X 超平場復(fù)消色差物鏡,NA0.16, 工作距離13mm,色差校準(zhǔn)范圍400-1000nm。
UPLXAPO10X
U Plan XApochromat objective 10X/0.4, WD 3.1mm,Coverglass thickness 0.17mm,Corrected wavelength400-1000nm. ZDC supported. 10X 超平場復(fù)消色差物鏡,NA0.4, 工作距離3.1mm,色差校準(zhǔn)范圍400-1000nm。
UPLXAPO20X
U Plan XApochromat objective 20X/0.8, WD 0.6mm,Coverglass thickness 0.17mm,Spring,Corrected wavelength400-1000nm.ZDC supported. 20X 超平場復(fù)消色差物鏡,NA0.8, 工作距離0.6mm,色差校準(zhǔn)范圍400-1000nm。
UPLXAPO40X
U Plan XApochromat objective 40X/0.95, WD 0.18mm,Coverglass thickness 0.11-0.23mm,Spring,Corrected wavelength400-1000nm.ZDC supported. 40X 超平場復(fù)消色差物鏡,NA0.95, 工作距離0.18mm,校正環(huán),色差校準(zhǔn)范圍400-1000nm。
UPLXAPO40XO
U Plan XApochromat objective 40X/1.4, WD 0.13mm(Spring,oil),Coverglass thickness 0.17mm,Corrected wavelength400-1000nm. BFP1. ZDC supported. 40X 超平場復(fù)消色差油浸物鏡,NA1.4, 工作距離0.13mm,色差校準(zhǔn)范圍400-1000nm。
UPLXAPO60XO
U Plan XApochromat objective 60X/1.42, WD 0.15mm(Spring,oil),Coverglass thickness 0.17mm,Corrected wavelength400-1000nm. ZDC supported. 60X 超平場復(fù)消色差油浸物鏡,NA1.42, 工作距離0.15mm,色差校準(zhǔn)范圍400-1000nm。
UPLXAPO100XO
U Plan XApochromat objective 100X/1.45, WD 0.13mm(Spring,oil),Coverglass thickness 0.17mm,Corrected wavelength400-1000nm. ZDC supported. 100X 超平場復(fù)消色差油浸物鏡,NA1.45 工作距離0.13mm,色差校準(zhǔn)范圍400-1000nm。
PLAPON1.25X
Plan apochromat objective 1.25X/0.04, WD 5.0 1.25X平場復(fù)消色差物鏡, NA 0.04, 工作距離5.0mm
PLAPON2X
Plan apochromat objective 2X/0.08, WD 6.2 2X平場復(fù)消色差物鏡, NA 0.08, 工作距離6.2mm
PLAPON60XOSC2
Super chromatic aberration correction N.A 1.4 60X色差校正熒光共定位專用油浸物鏡, NA 1.4
UCPLFLN20X
UIS2 objectives for cell culture, live cell, iPS cell, stem cell, etc. Suitable for typical inverted microscope application having high NA and wide observation area. Correction collar. NA0.7, WD 0.8-1.8. coverslip thickness 0-1.6(optimized for glass slip). DIC is applicable(IX-DIC20). 20X高分辨率長工作距離平場半復(fù)消色差物鏡, NA 0.7, 工作距離0.8-1.8mm
LUCPLFLN20X
Long working distance Plan SemiApochromat objective 20X, NA 0.45, WD 6.6-7.8(c.c.0-2) 20X長工作距離平場半復(fù)消色差物鏡, NA 0.45, 工作距離6.6-7.8mm
LUCPLFLN40X
Long working distance Plan SemiApochromat objective 40X, NA 0.6, WD 2.7-4.0(c.c.0-2) 40X長工作距離平場半復(fù)消色差物鏡, NA 0.6, 工作距離2.7-4.0mm
LUCPLFLN60X
Long working distance Plan SemiApochromat objective 60X, NA 0.70, WD 1.5-2.2(c.c.0.1-1.3) 60X長工作距離平場半復(fù)消色差物鏡, NA 0.7, 工作距離1.5-2.2mm
無蓋片物鏡
MPLN5X
M Plan Achromat objective 5X/N.A. 0.1, W.D. 20mm 5X物鏡, NA 0.1, 工作距離20mm
MPLFLN2.5X
M Plan Semi Apochromat Objective Lens 2.5x/N.A. 0.08, W.D. 10.7mm with depolarizer 2.5X平場半復(fù)消色差無蓋片物鏡, NA 0.08, 工作距離10.7mm
MPLFLN10X
M Plan Semi Apochromat objective lens 10x/N.A. 0.3, W.D. 11mm 10X平場半復(fù)消色差無蓋片物鏡, NA 0.3, 工作距離11mm
MPLFLN20X
M Plan Semi Apochromat objective lens 20x/N.A. 0.45, W.D. 3.1mm 20X平場半復(fù)消色差無蓋片物鏡, NA 0.45, 工作距離3.1mm
MPLFLN40X
M plan semi apochromat objective 40X/0.75, W.D. 0.63(spring) 40X平場半復(fù)消色差無蓋片物鏡, NA 0.75, 工作距離0.63mm
MPLFLN50X
M Plan Semi Apochromat objective lens 50x/N.A. 0.8, W.D. 1.0mm 50X平場半復(fù)消色差無蓋片物鏡, NA 0.8, 工作距離1.0mm
MPLFLN100X
M Plan Semi Apochromat objective lens 100x/N.A. 0.9, W.D. 1.0mm 100X平場半復(fù)消色差無蓋片物鏡, NA 0.9, 工作距離1.0mm
MPLAPON50X
M Plan Apochromat Objective Lens 50X/0.95, WD:0.35 50X平場復(fù)消色差無蓋片物鏡, NA 0.95, 工作距離0.35mm
MPLAPON60X
M plan apochromat objective 60X/0.90, W.D. 0.4,(spring) 60X平場復(fù)消色差無蓋片物鏡, NA 0.90, 工作距離0.4mm
MPLAPON100X
M Plan Apochromat Objective Lens 100X/0.95, WD:0.35 100X平場復(fù)消色差無蓋片物鏡, NA 0.95, 工作距離0.35mm
MPLAPON100XO2
M plan Apochromat objective 100X/1.45 N, WD 0.13(oil) 100X平場復(fù)消色差無蓋片油浸物鏡, NA 1.45, 工作距離0.13mm
偏光物鏡
PLN4XP
Plan achromat polarising objective 4X/0.1. WD 18.5 4X偏光物鏡, NA 0.1, 工作距離18.5mm
ACHN10XP
Achromat polarising objective 10X/0.25, WD 6 10X偏光物鏡, NA 0.25, 工作距離6mm
ACHN20XP
Achromat polarising objective 20X/0.4, WD 3 20X偏光物鏡, NA 0.4, 工作距離3mm
ACHN40XP
Achromat polarising objective 40X/0.65, WD 0.45(spring) 40X偏光物鏡, NA 0.65, 工作距離0.45mm
U Plan Semi apochromat polarizing objective 4X/0.13, W.D. 17.0 4X平場半復(fù)消色差偏光物鏡, NA 0.13, 工作距離17.0mm
UPLFLN10XP
U Plan Semi apochromat polarizing objective 10X/0.30, W.D. 10.0 10X平場半復(fù)消色差偏光物鏡, NA 0.30, 工作距離10.0mm
UPLFLN20XP
U Plan Semi apochromat polarizing objective 20X/0.50, W.D. 2.1 20X平場半復(fù)消色差偏光物鏡, NA 0.50, 工作距離2.1mm
UPLFLN40XP
U Plan Semi apochromat polarizing objective 40X/0.75, W.D. 0.51(spring) 40X平場半復(fù)消色差偏光物鏡, NA 0.75, 工作距離0.51mm
UPLFLN100XOP
U Plan Semi apochromat polarizing objective 100X/1.3, W.D. 0.2(spring) 100X平場半復(fù)消色差偏光油浸物鏡, NA 1.3, 工作距離0.2mm
PH物鏡
PLCN10XPH
Plan achromat phase contrast objective 10X/0.25, WD 10.6 10X平場消色差相差物鏡, NA 0.25, 工作距離10.6mm
PLCN20XPH
Plan achromat phase contrast objective 20X/0.4, WD 1.2(spring) 20X平場消色差相差物鏡, NA 0.4, 工作距離1.2mm
PLCN40XPH
Plan achromat phase contrast objective 40X/0.65, WD 0.6(spring) 40X平場消色差相差物鏡, NA 0.65, 工作距離0.6mm
PLCN100XOPH
Plan achromat phase contrast objective 100X/1.25, WD 0.15(spring, oil) 100X平場消色差相差油浸物鏡, NA 1.25, 工作距離0.15mm
PLN10XPH
Plan achromat phase objective 10X/0.25, WD 10.6 10X平場消色差相差物鏡, NA 0.25, 工作距離10.6mm
CPLN10XPH
Plan achromat phase objective 10X, NA 0.25, WD 10 10X相差物鏡, NA 0.25, 工作距離10mm
PLN20XPH
Plan achromat phase objective 20X/0.4, WD 1.2(spring) 20X平場消色差相差物鏡, NA 0.4, 工作距離1.2mm
PLN40XPH
Plan achromat phase objective 40X/0.65, WD 0.6(spring) 40X平場消色差相差物鏡, NA 0.65, 工作距離0.6mm
PLN100XOPH
Plan achromat phase objective 100X/1.25, WD 0.15(spring, oil) 100X平場消色差相差油浸物鏡, NA 1.25, 工作距離0.15mm
UPLFLN4XPH
U plan semi apochromat phase objective 4X/0.13, WD 17 4X平場半復(fù)消色差相差物鏡, NA 0.13, 工作距離17mm
UPLFLN10X2PH
U Plan Semi Apochromat phase objective 10X/0.3, WD 10 10X平場半復(fù)消色差相差物鏡, NA 0.3, 工作距離10mm
CPLFLN10XPH
Plan semi apochromat phase objecive 10X, NA 0.30, WD 9.5 10X平場半復(fù)相差物鏡, NA 0.3, 工作距離9.4mm
UPLFLN20XPH
U plan semi apochromat phase objective 20X/0.5, WD 1.6 20X平場半復(fù)消色差相差物鏡, NA 0.5, 工作距離1.6mm
UPLFLN40XPH
U plan semi apochromat phase objective 40X/0.75, WD 0.51(spring) 40X平場半復(fù)消色差相差物鏡, NA 0.75, 工作距離0.51mm
UPLFLN60XOIPH
U plan semi apochromat phase objective 60X/1.25-0.65, WD 0.12(spring, oil, iris) 60X平場半復(fù)消色差相差油浸物鏡, NA 1.25-0.65, 工作距離0.12mm,帶虹彩光闌
UPLFLN100XO2PH
U Plan Semi Apochromat phase objective 100X/1.3, WD 0.2(spring, oil) 100X平場半復(fù)消色差相差油浸物鏡, NA 1.3, 工作距離0.2mm
UPLXAPO60XOPH
U Plan Xapochromat phase contrast objective 60X/1.42, WD 0.15mm(Spring,oil),Coverglass thickness 0.17mm,Corrected wavelength400-1000nm. ZDC supported. 60X 超平場復(fù)消色差油浸相襯物鏡,NA1.42, 工作距離0.15mm,色差校準(zhǔn)范圍400-1000nm。
UPLXAPO100XOPH
U Plan XApochromat phase contrast objective 100X/1.45, WD 0.13mm(Spring,oil),Coverglass thickness 0.17mm,Corrected wavelength400-1000nm. 100X 超平場復(fù)消色差油浸相襯物鏡,NA1.45 工作距離0.13mm,色差校準(zhǔn)范圍400-1000nm。
LCACHN20XPH
Long working distance achromat phase objective 20X/0.4, WD 3.2 20X長工作距離相差物鏡, NA 0.4, 工作距離3.2mm
LCACHN40XPH
Long working distance achromat phase objective 40X/0.55, WD 2.2 40X長工作距離相差物鏡, NA 0.55, 工作距離2.2mm
UCPLFLN20XPH
UIS2 phase contrast objectives for cell culture, live cell, iPS cell, stem cell, etc. Suitable for typical inverted microscope application having high NA and wide observation area. Correction collar. NA0.7, WD 0.8-1.8. coverslip thickness 0-1.6(optimized for plastic). 20X高分辨率長工作距離平場半復(fù)消色差相差物鏡, NA 0.7, 工作距離0.8-1.8mm
LUCPLFLN20XPH
Long working distance plan semiapochromat phase objective 20X,NA 0.45, WD 6.6-7.8(c.c.0-2) 20X長工作距離平場半復(fù)消色差相差物鏡, NA 0.45, 工作距離6.6-7.8mm
LUCPLFLN40XPH
Long working distance plan semiapochromat phase objective 40X,NA 0.6,WD 3.0-4.2(c.c.0-2) 40X長工作距離平場半復(fù)消色差相差物鏡, NA 0.6, 工作距離3.0-4.2mm
LUCPLFLN60XPH
Long working distance plan semiapochlomat phase objective 60X,NA 0.70,WD 1.5-2.2(c.c.0.1-1.3) 60X長工作距離平場半復(fù)消色差相差物鏡, NA 0.7, 工作距離1.5-2.2mm
RC物鏡
CPLN10XRC
Plan achromat relief contrast objective 10X,NA 0.25, WD 9.7 10X浮雕相襯物鏡, NA 0.25, 工作距離9.7mm
LCACHN20XRC
Long working distance achromat relief contrast objective 20X/0.4, WD 2.8 20X長工作距離浮雕相襯物鏡, NA 0.4, 工作距離2.8mm
LCACHN40XRC
Long working distance achromat relief contrast objective 40X/0.55, WD 1.9 40X長工作距離浮雕相襯物鏡, NA 0.55, 工作距離1.9mm
CPLFLN10XRC
Plan semi apochromat relief contrast objective 10X, NA 0.30, WD 9.0 10X平場半復(fù)浮雕相襯物鏡, NA 0.3, 工作距離9.0mm
LUCPLFLN20XRC
Long working distance Plan SemiApochromat relief contrast objective 20X, NA 0.45, WD 6.6-7.8(c.c.0-2) 20X長工作距離平場半復(fù)消色差浮雕相襯物鏡, NA 0.45, 工作距離6.6-7.8mm
LUCPLFLN40XRC
Long working distance Plan SemiApochromat relief contrast objective 40X, NA 0.6, WD 3.0-4.2(c.c.0-2) 40X長工作距離平場半復(fù)消色差浮雕相襯物鏡, NA 0.6, 工作距離3.0-4.2mm
TIRF物鏡/超分辨物鏡
UPLAPO60XOHR
U Plan Apochromat High Resolution objective 60X/1.5, WD 0.11( oil)with correction collar(cover glass:0.13-0.19, 23/37℃),BFP1. ZDC supported. 60X 平場復(fù)消色差高分辨率/TIRF油浸物鏡,NA1.5, 工作距離0.11mm,23/37℃蓋玻片厚度0.13-0.19mm校正環(huán)
UPLAPO100XOHR
U Plan Apochromat High Resolution objective 100X/1.5, WD 0.12( oil)with correction collar(cover glass:0.13-0.19, 23/37℃).ZDC supported. 100X 平場復(fù)消色差高分辨率/TIRF油浸物鏡,NA1.5, 工作距離0.12mm,23/37℃蓋玻片厚度0.13-0.19mm校正環(huán)
UAPON150XOTIRF
U Apochromat objective for TIRF microscopy 150X/1.45, W.D. 0.08, C.C. 0.13mm-0.19mm for 23 degrees and 37degrees,(oil, 340nm applicable) 150X TIRF專用物鏡, NA 1.45, 工作距離0.08mm
APON100XHOTIRF
UIS2 Objectives for TIRF application. High NA apochromatic correction 100X. Exclusive immersion oil is required from Cargille(Series M NA1.78). NA1.7, WD 0.08, correction collar. DIC is applicable. 100X TIRF專用物鏡, NA 1.7, 工作距離0.08mm
HIGHINDEX-CG
HIGHINDEX-CG Cover slip for APON100XHOTIRF. Thickness 0.15mm, Diameter 20mm, 10pcs. High refractive index. This coverslip can be used for UIS1(APO100XOHR)as well. 100X TIRF物鏡專用蓋片
硅油物鏡
UPLSAPO30XS
U plan super apochromat objective 30X/1.05, WD 0.8(Silicone) 30X平場復(fù)消色差硅油物鏡, NA 1.05, 工作距離0.8mm
UPLSAPO30XSIR
U plan super apochromat objective 30X, NA1.05, WD 0.8mm, Silicone Immersion Objective lens, 400-1600nm applicable. 30X平場復(fù)消色差紅外高透過率硅油物鏡, NA 1.05, 工作距離0.8mm
UPLSAPO40XS
U plan super apochromat objective 40X/1.25, WD 0.3(Silicone) 40X平場復(fù)消色差硅油物鏡, NA 1.25, 工作距離0.3mm
UPLSAPO60XS2
U plan super apochromat objective 60X/1.3, WD 0.3(spring, silicone) 60X平場復(fù)消色差硅油物鏡, NA 1.3, 工作距離0.3mm
UPLSAPO100XS
U plan super apochromat objective 100X, NA1.35, WD 0.2mm,(spring, silicone)with oil pan 100X平場復(fù)消色差硅油物鏡, NA 1.35, 工作距離0.2mm
SCALEVIEW物鏡
XLPLN25XSVMP2
SCALEVIEW immersion objective for multi-photon 25X/1.0, W.D. 4.0mm with correction collar(c.c. 0-0.23), 400-1600nm applicable. 25X多光子專用SCALEVIEW物鏡, NA 1.0, 工作距離4.0mm
XLSLPLN25XSVMP2
SCALEVIEW immersion objective for multi-photon 25X/0.95, W.D. 8.0mm with correction collar(c.c. 0-0.23), 400-1600nm applicable. 25X多光子專用SCALEVIEW物鏡, NA 0.95, 工作距離8.0mm
水浸物鏡
UMPLFLN10XW
U M Plan Semi Apochromat water immersion objective 10X/0.3, W.D. 3.3mm. 340nm and IR-DIC(900nm)applicable 10X紅外高透過率水浸物鏡, NA 0.3, 工作距離3.3mm
UMPLFLN20XW
U M Plan Semi Apochromat water immersion objective 20X/0.5, W.D. 3.3mm. 340nm and IR-DIC(900nm)applicable 20X紅外高透過率水浸物鏡, NA 0.5, 工作距離3.3mm
LUMPLFLN40XW
Long working distance U M Plan Semi Apochromat water immersionobjective 40X/0.8, W.D. 3.3mm 340nm and IR-DIC(900nm)applicable 長工作距離40X紅外高透過率水浸物鏡, NA 0.8, 工作距離3.3mm
LUMPLFLN60XW
Long working distance U M Plan Semi Apochromat water immersionobjective 60X/1.0, W.D. 2.0mm 340nm and IR-DIC(900nm)applicable 長工作距離60X紅外高透過率水浸物鏡, NA 1.0, 工作距離2.0mm
LUMFLN60XW
Long working distance U M Semi Apochromat water immersion objective 60X/1.1, W.D.1.5mm.340nm and IR-DIC(900nm)applicable. Correction Collar. 長工作距離60X紅外高透過率水浸物鏡, NA 1.1, 工作距離1.5mm
UPLSAPO60XW
U plan super apochromat water immersion objective 60X/1.2, WD 0.28 with correction collar(spring, c.c.0.15-0.2) 60X平場復(fù)消色差水鏡, NA 1.2, 工作距離0.28mm
XLUMPLFLN20XW
Long working distance semi apochromat water immersion objective 20X/1.0, W.D. 2.0mm, including caution tag AF9168(340nm applicable, 700-1000nm applicable) 20X長工作距離半復(fù)消色差水鏡, NA 1.0, 工作距離2.0mm
XLPLN25XWMP2
Water immersion objective for multi-photon 25X/1.05, W.D. 2.0mm with correction collar(c.c. 0-0.23), 400-1600nm applicable. 25X多光子專用水浸物鏡, NA 1.05, 工作距離2.0mm
XLSLPLN25XGMP
High refractive index immersion(ne:1.41 to 1.52)objective for multi-photon 25X, NA1.0, WD 8.0mm with correction collar(cover glass:0-0.23, ne:1.41-1.52), 400-1600nm applicable. 25X多光子專用高折射率介質(zhì)物鏡, NA 1.0, 工作距離8.0mm
高紫外透過率物鏡
XLFLUOR2X/340
Plan Semi Apochromat objective 2X/0.14, W.D. 21 2X長工作距離平場半復(fù)消色差紫外高透過率物鏡, NA 0.14, 工作距離21mm
XLFLUOR4X/340
Long working distance Semi Apochromat objective 4X/0.28, W.D. 28.75(to be used in conjunction with U-SLRE, 340nm applicable) 4X長工作距離平場半復(fù)消色差紫外高透過率物鏡, NA 0.28, 工作距離28.75mm
UAPON20XW340
U apochromat water immersion objective 20X/0.70, W.D. 0.35(water, spring, 340nm applicable),including storage case(body:AZ9525 and cap:AZ9526) 20X復(fù)消色差紫外高透過率水浸物鏡, NA 0.7, 工作距離0.35mm
UAPON40XW340
U apochromat water immersion objective 40X/1.15, W.D. 0.25, C.C. 0.13mm-0.25mm(water, spring, 340nm applicable), including storage case(body:AZ9525 and cap:AZ9526) 40X復(fù)消色差紫外高透過率水浸物鏡, NA 1.15, 工作距離0.25mm
UAPON40XO340-2
U apochromat objective 40X/1.35, W.D. 0.1(oil, spring, 340nm applicable), including storage case(body:AZ9525 and cap:AZ9526) 40X復(fù)消色差紫外高透過率水浸物鏡, NA 1.35, 工作距離0.1mm